• 文献标题:   Electronic Properties of Microscale Reduced Graphene Oxide Patterned by Micromolding
  • 文献类型:   Article
  • 作  者:   ZHANG J, WANG ZL, HU PA, FU YQ, PLACIDO F
  • 作者关键词:   soft lithography, reduced graphene oxide pattern, variable range hopping
  • 出版物名称:   NANOSCIENCE NANOTECHNOLOGY LETTERS
  • ISSN:   1941-4900 EI 1941-4919
  • 通讯作者地址:   Harbin Inst Technol
  • 被引频次:   4
  • DOI:   10.1166/nnl.2012.1409
  • 出版年:   2012

▎ 摘  要

Highly uniform reduced graphene oxide (rGO) array patterns with both stripe and square shapes have been fabricated on various substrates using PDMS based soft lithography. Morphology, structure and electrical properties of the GO patterns before and after annealing at 800 degrees C in H-2 atmosphere were investigated. The conductivity and carriers mobilities of the rGO patterns were improved by four orders after H-2-reduction. Temperature-dependent electrical measurements showed that charge transport occurs via a variable range hopping mechanism.