• 文献标题:   Atomic and electronic structure of graphene oxide/Cu interface
  • 文献类型:   Article
  • 作  者:   BOUKHVALOV DW, KURMAEV EZ, URBANCZYK E, DERCZ G, STOLARCZYK A, SIMKA W, KUKHARENKO AI, ZHIDKOV IS, SLESAREV AI, ZATSEPIN AF, CHOLAKH SO
  • 作者关键词:   graphene, graphene oxide, reduced graphene oxide, density functional theory, xray photoelectron spectroscopy, conductivity
  • 出版物名称:   THIN SOLID FILMS
  • ISSN:   0040-6090
  • 通讯作者地址:   Hanyang Univ
  • 被引频次:   4
  • DOI:   10.1016/j.tsf.2018.09.002
  • 出版年:   2018

▎ 摘  要

The results of X-ray photoemission (XPS) and valence bands spectroscopy, optically stimulated electron emission (OSEE) measurements and density functional theory based modeling of graphene oxide (GO) placed on Cu via an electrophoretic deposition (EPD) are reported. The comparison of XPS spectra of EPD prepared GO/Cu composites with those of as prepared GO, strongly reduced GO, pure and oxidized copper demonstrate the partial (until C/O ratio about two) removal of oxygen-containing functional groups from GO simultaneously with the formation of copper oxide-like layers over the metallic substrate. OSEE measurements evidence the presence of copper oxide phase in the systems simultaneously with the absence of contributions from GO with corresponding energy gap. All measurements demonstrate the similarity of the results for different thickness of GO cover of the copper surface. Theoretical modeling demonstrates favorability of migration of oxygen-containing functional groups from GO to the copper substrate only for the case of C/O ratio below two and formation of Cu-O-C bonds between substrate and GO simultaneously with the vanishing of the energy gap in GO layer. Basing on results of experimental measurements and theoretical calculations we suggest the model of atomic structure for Cu/GO interface as Cu/CuO/GO with C/O ratio in gapless GO about two.