• 文献标题:   Metal-semiconductor-metal ultraviolet photodiodes based on reduced graphene oxide/GaN Schottky contacts
  • 文献类型:   Article, Proceedings Paper
  • 作  者:   PANDIT B, CHO J
  • 作者关键词:   graphene oxide, gallium nitride, metalsemiconductormetal photodiode, schottky barrier height
  • 出版物名称:   THIN SOLID FILMS
  • ISSN:   0040-6090
  • 通讯作者地址:   Chonbuk Natl Univ
  • 被引频次:   4
  • DOI:   10.1016/j.tsf.2018.03.035
  • 出版年:   2018

▎ 摘  要

We report on the characteristics of reduced graphene oxide (rGO)/GaN Schottky diodes in which the reduction process is performed at various temperatures. The Schottky barrier height of the rGO/GaN Schottky diode peaks at 1.07 eV with the reduction temperature of 650 degrees C, caused by changes in the O-containing functional groups and surface Fermi-level pinning during thermal reduction. The interdigitated rGO/GaN metal-semiconductor-metal photodiode using GO reduced at 650 degrees C exhibits a responsivity of 0.128 A/W under 365-nm illumination, with a sharp cutoff near the GaN energy bandgap.