• 文献标题:   Response surface methodology to optimize the performance of reduced graphene oxide-mesoporous carbon nitride photocatalysts
  • 文献类型:   Article
  • 作  者:   YULIATI L, TIONG P, LINTANG HO
  • 作者关键词:   reduced graphene oxide, mesoporous carbon nitride, rsm, light intensity, uv reduction duration, npyr degradation
  • 出版物名称:   MATERIALS RESEARCH EXPRESS
  • ISSN:   2053-1591
  • 通讯作者地址:   Univ Ma Chung
  • 被引频次:   0
  • DOI:   10.1088/2053-1591/ab180d
  • 出版年:   2019

▎ 摘  要

The synthesis parameters to prepare the reduced graphene oxide-mesoporous carbon nitride photocatalyst by an in situ photocatalytic reduction of graphene oxide in the presence of mesoporous carbon nitride as the photocatalyst were investigated for degradation of N-Nitrosopyrrolidine (NPYR) under visible light irradiation. The optimum synthesis condition with optimized NPYR degradation was achieved on the composite sample with GO loading of 5 wt%, which was synthesized under low UV light intensity (0.4 mW cm(-2)) and long UV reduction duration (24 h), while sonication time did not give a significant effect on the photocatalytic performance. From the response surface methodology (RSM) analysis, the predicted values were confirmed to be in good agreement with the experimental values with a high correlation coefficient (R-2) of 0.9989. This study also demonstrated that the predicted optimum NPYR degradation matched well with the experimental conditions. The radical scavenger tests revealed that the holes and superoxide radicals play as important active sites for photocatalytic degradation of NPYR on the rGO-mCN composite.