• 文献标题:   Numerical study on the performance metrics of lightly doped drain and source graphene nanoribbon field effect transistors with double-material-gate
  • 文献类型:   Article
  • 作  者:   WANG W, YANG X, LI N, ZHANG L, ZHANG T, YUE GS
  • 作者关键词:   gnrfet, negf, ldd, doublematerialgate, highfrequency
  • 出版物名称:   SUPERLATTICES MICROSTRUCTURES
  • ISSN:   0749-6036
  • 通讯作者地址:   Nanjing Univ Posts Telecommun
  • 被引频次:   16
  • DOI:   10.1016/j.spmi.2013.09.032
  • 出版年:   2013

▎ 摘  要

In this paper, we perform a theoretical study on the performance metrics of the lightly doped drain and source (LDD) of double-material-gate graphene nanoribbon field effect transistors (GNRFETs). A quantum model based on the non-equilibrium Green's function (NEGF) coupled with a three dimensional Poisson equation under the ballistic limits in the mode space is applied. To highlight the superior performances of LDD structure, comparisons have been made between single-material-gate GNRFETs with conventional doping (C-GNRFETs), single-material-gate GNRFETs with LDD (LDD-GNRFTEs), double-material-gate GNRFETs with conventional doping (DM-GNRFETs) and double-material-gate GNRFETs with LDD (LDD-DM-GNRFETs). The results demonstrates that LDD-DM structure has lower leakage current, better sub-threshold swing performance, larger I-on/I-off ratio, lower delay time and higher cutoff frequency, which indicates LDD-DM-GNRFETs a promising material for high-speed and lower power applications. (C) 2013 Elsevier Ltd. All rights reserved.