• 文献标题:   Observation of chiral quantum-Hall edge states in graphene
  • 文献类型:   Article
  • 作  者:   KI DK, JO S, LEE HJ
  • 作者关键词:   contact resistance, electrical contact, graphene, quantum hall effect
  • 出版物名称:   APPLIED PHYSICS LETTERS
  • ISSN:   0003-6951
  • 通讯作者地址:   Pohang Univ Sci Technol
  • 被引频次:   13
  • DOI:   10.1063/1.3123265
  • 出版年:   2009

▎ 摘  要

In this study, we determined the chiral direction of the quantum-Hall (QH) edge states in graphene by adopting simple two-terminal conductance measurements while grounding different edge positions of the sample. The edge state with a smaller filling factor is found to more strongly interact with the electric contacts. This simple method can be conveniently used to investigate the chirality of the QH edge state with zero filling factor in graphene, which is important to understand the symmetry breaking sequence in high magnetic fields (greater than or similar to 25 T).