• 文献标题:   Nanoconfined Crystal Growth of Copper-Intercalated Graphene Oxide Interlayers
  • 文献类型:   Article
  • 作  者:   DONG SH, WANG HQ, WU HR, LIU J, ZHAO JH
  • 作者关键词:  
  • 出版物名称:   JOURNAL OF PHYSICAL CHEMISTRY C
  • ISSN:   1932-7447 EI 1932-7455
  • 通讯作者地址:  
  • 被引频次:   2
  • DOI:   10.1021/acs.jpcc.2c04961 EA SEP 2022
  • 出版年:   2022

▎ 摘  要

Recently, graphene oxide (GO) has been taken as a host for ultra-fast self-assembly of metal nanoparticles [Nat. Commun. 2016, 7, 12332] or synthesis of ultrathin and mechanically robust lithium foils [Nat. Energy 2021, 6, 790-798]. However, the main factors dominating preparations of these nanoconfined metals are still not dear. In this study, the crystal growth mechanism of copper (Cu) nanosheet-intercalated GO interlayers has been revealed by combining theoretical models with molecular dynamics simulations. Both the interlayer spacing and oxidation degree of GO play key roles in crystal growth velocities, which increase with increasing interlayer spacings but decrease with increasing oxidation degrees. The phenomenon is found to be a consequence of crystal growth being energetically favorable and a small ratio of interfacial van der Waals-affected zones for larger crystal thicknesses and strong hydrophilic properties of GO with higher oxidation degrees. In addition, more smooth surfaces have been observed for nanoconfined metals. These insights provide an effective method for generating nanocrystalline metals in a nanoconfined environment.