• 文献标题:   A silicon nitride waveguide-integrated chemical vapor deposited graphene photodetector with 38 GHz bandwidth
  • 文献类型:   Article
  • 作  者:   GAO Y, TSANG HK, SHU C
  • 作者关键词:  
  • 出版物名称:   NANOSCALE
  • ISSN:   2040-3364 EI 2040-3372
  • 通讯作者地址:   Chinese Univ Hong Kong
  • 被引频次:   2
  • DOI:   10.1039/c8nr03345e
  • 出版年:   2018

▎ 摘  要

We demonstrate a high-speed chemical vapor deposited graphene-on-silicon nitride waveguide photodetector. The device is designed with grating-like metal contact to reduce the channel spacing. Benefiting from the narrow channel spacing, a calculated transit-time-limited bandwidth of 111 GHz is derived. The resistance-capacitance-limited bandwidth is also improved due to the small relative permittivity of silicon nitride. At a wavelength of 1550 nm, we measured an electro-optic bandwidth of 38 GHz under zero bias and an intrinsic responsivity of 13 mA W-1 at 0.1 V reverse bias with a 6 m detection length.