• 文献标题:   Engineering of the topological magnetic moment of electrons in bilayer graphene using strain and electrical bias
  • 文献类型:   Article
  • 作  者:   MOULSDALE C, KNOTHE A, FAL KO V
  • 作者关键词:  
  • 出版物名称:   PHYSICAL REVIEW B
  • ISSN:   2469-9950 EI 2469-9969
  • 通讯作者地址:   Univ Manchester
  • 被引频次:   2
  • DOI:   10.1103/PhysRevB.101.085118
  • 出版年:   2020

▎ 摘  要

The topological properties of electronic states in multivalley two-dimensional materials, such as mono- and bilayer graphene, or thin films of rhombohedral graphite give rise to various unusual magnetotransport regimes. Here, we investigate the tunability of the topological magnetic moment (related to the Berry curvature) of electronic states in bilayer graphene using strain and vertical bias. We show how one can controllably vary the valley g factor of the band-edge electrons g(v)* across the range 10 < vertical bar g(v)*vertical bar < 200, and we discuss the manifestations of the topological magnetic moment in the anomalous contribution towards the Hall conductivity and in the Landau level spectrum.