▎ 摘　　要

Top-gated devices made from an epitaxial graphene film on a 4H-SiC substrate were fabricated. Atomic force microscopy and Raman spectroscopy results showed that a large-scale highly uniform monolayer graphene film was synthesized on the SiC substrate. A SiNx passivation film was deposited on a SiC graphene device as a top gate insulator by catalytic chemical-vapor deposition (Cat-CVD) below 65 degrees C. After the top gate electrode was formed on the SiNx film, no leakage current flowed between the gate and source electrodes. The transport characteristics showed clear ambipolar characteristics from 8 to 280 K, and the temperature dependences of the conductance and field-effect mobility of the devices implied that monolayer graphene devices can be successfully fabricated. Moreover, the position of the charge neutrality point after SiNx deposition was around 0 V, indicating p-doping characteristics. These results indicate that SiNx films synthesized by Cat-CVD can be used as gate insulators and that the carrier type may be controlled by adjusting the deposition conditions. (C) 2016 The Japan Society of Applied Physics