• 文献标题:   Ultralow-contact-resistance graphene field-effect transistors fabricated with P-type solution doping
  • 文献类型:   Editorial Material
  • 作  者:   HUANG KY, CHOU AS, LIU SY, CHENG WY, HUNG CL, LI CS, HO MS, WU CI
  • 作者关键词:  
  • 出版物名称:   APPLIED PHYSICS EXPRESS
  • ISSN:   1882-0778 EI 1882-0786
  • 通讯作者地址:   Natl Taiwan Univ
  • 被引频次:   0
  • DOI:   10.7567/APEX.11.075102
  • 出版年:   2018

▎ 摘  要

We developed a polymer-free (PF) transfer method and examined the optimum annealing temperature and time for the polymer-free graphene to improve the graphene-metal contact. To further tune the work function of graphene to reduce contact resistance, we report solution doping combined with the PF method, and by using P-doped graphene, the contact resistance is markedly reduced to 24 Omega mu m, which is an extremely low value in recent research. Photoemission spectroscopy was used to investigate the graphene/Au interface to explain the results of our contact resistance measurements, and the highest FET mobility of these low-contact devices was 14400 cm(2)V(-1)s(-1) for intrinsic graphene in this study. (C) 2018 The Japan Society of Applied Physics.