• 文献标题:   Deposition of an Ultraflat Graphene Oxide Nanosheet on Atomically Flat Substrates
  • 文献类型:   Article
  • 作  者:   KHAN MZH, SHAHED SMF, YUTA N, KOMEDA T
  • 作者关键词:   graphene oxide, nanosheet, atomically flat substrate, surface propertie, afm, sem
  • 出版物名称:   JOURNAL OF ELECTRONIC MATERIALS
  • ISSN:   0361-5235 EI 1543-186X
  • 通讯作者地址:   Tohoku Univ
  • 被引频次:   3
  • DOI:   10.1007/s11664-017-5327-x
  • 出版年:   2017

▎ 摘  要

In this study, graphene oxide (GO) sheets produced in the form of stable aqueous dispersions were deposited on Au (111), freshly cleaved mica, and highly oriented pyrolytic graphite (HOPG) substrates. Atomic force microscopy (AFM) and scanning electron microscopy (SEM) were used to study the presence and distinct contact of GO sheets on the substrates. It was revealed from the topography images that high-quality ultraflat GO monolayer sheets formed on the substrates without distinct cracking/wrinkling or folding. GO sheets with apparent height variation observed by microscopy also indicate ultraflat deposition with clear underlying steps. It was observed that ultrasonication and centrifuge steps prior to deposition were very effective for getting oxidation debris (OD)-free ultraflat single monolayer GO nanosheets onto substrates and that the process depends on the concentration of supplied GO solutions.