• 文献标题:   Polycrystalline Few-Layer Graphene as a Durable Anticorrosion Film for Copper
  • 文献类型:   Article
  • 作  者:   ZHAO ZJ, HOU TY, WU NN, JIAO SP, ZHOU K, YIN J, SUK JW, CUI X, ZHANG MF, LI SP, QU Y, XIE WG, LI XB, ZHAO CX, FU Y, HONG RD, GUO SS, LIN DQ, CAI WW, MAI WJ, LUO ZT, TIAN YT, LAI Y, LIU YY, COLOMBO L, HAO YF
  • 作者关键词:   fewlayer graphene, chemical vapor deposition, anticorrosion, grain boundarie, polycrystalline
  • 出版物名称:   NANO LETTERS
  • ISSN:   1530-6984 EI 1530-6992
  • 通讯作者地址:  
  • 被引频次:   31
  • DOI:   10.1021/acs.nanolett.0c04724 EA JAN 2021
  • 出版年:   2021

▎ 摘  要

Corrosion of metals in atmospheric environments is a worldwide problem in industry and daily life. Traditional anticorrosion methods including sacrificial anodes or protective coatings have performance limitations. Here, we report atomically thin, polycrystalline few-layer graphene (FLG) grown by chemical vapor deposition as a long-term protective coating film for copper Cu). A six-year old, FLG-protected Cu is visually shiny and detailed material characterizations capture no sign of oxidation. The success of the durable anticorrosion film depends on the misalignment of grain boundaries between adjacent graphene layers. Theoretical calculations further found that corrosive molecules always encounter extremely high energy barrier when diffusing through the FLG layers. Therefore, the FLG is able to prevent the corrosive molecules from reaching the underlying Cu surface. This work highlights the interesting structures of polycrystalline FLG and sheds insight into the atomically thin coatings for various applications.