• 文献标题:   Etching gas-sieving nanopores in single-layer graphene with an angstrom precision for high-performance gas mixture separation
  • 文献类型:   Article
  • 作  者:   ZHAO J, HE G, HUANG S, VILLALOBOS LF, DAKHCHOUNE M, BASSAS H, AGRAWAL KV
  • 作者关键词:  
  • 出版物名称:   SCIENCE ADVANCES
  • ISSN:   2375-2548
  • 通讯作者地址:   EPFL
  • 被引频次:   35
  • DOI:   10.1126/sciadv.aav1851
  • 出版年:   2019

▎ 摘  要

One of the bottlenecks in realizing the potential of atom-thick graphene membrane for gas sieving is the difficulty in incorporating nanopores in an otherwise impermeable graphene lattice, with an angstrom precision at a high-enough pore density. We realize this design by developing a synergistic, partially decoupled defect nucleation and pore expansion strategy using O-2 plasma and O-3 treatment. A high density (ca. 2.1 x 10(12) cm(-2)) of H-2-sieving pores was achieved while limiting the percentage of CH4-permeating pores to 13 to 22 parts per million. As a result, a record-high gas mixture separation performance was achieved (H-2 permeance, 1340 to 6045 gas permeation units; H-2/CH4 separation factor, 15.6 to 25.1; H-2/C3H8 separation factor, 38.0 to 57.8). This highly scalable pore etching strategy will accelerate the development of single-layer graphene-based energy-efficient membranes.