• 文献标题:   Strain Relaxation in CVD Graphene: Wrinkling with Shear Lag
  • 文献类型:   Article
  • 作  者:   BRONSGEEST MS, BENDIAB N, MATHUR S, KIMOUCHE A, JOHNSON HT, CORAUX J, POCHET P
  • 作者关键词:   graphene on cobalt, strain relief, buckling, raman spectroscopy, shear lag, uniaxial strain
  • 出版物名称:   NANO LETTERS
  • ISSN:   1530-6984 EI 1530-6992
  • 通讯作者地址:   Univ Grenoble Alpes
  • 被引频次:   32
  • DOI:   10.1021/acs.nanolett.5b01246
  • 出版年:   2015

▎ 摘  要

We measure uniaxial strain fields in the vicinity of edges and wrinkles in graphene prepared by chemical vapor deposition (CVD), by combining microscopy techniques and local vibrational characterization. These strain fields have magnitudes of several tenths of a percent and extend across micrometer distances. The nonlinear shear-lag model remarkably captures these strain fields in terms of the graphene substrate interaction and provides a complete understanding of strain-relieving wrinkles in graphene for any level of graphene substrate coherency.