• 文献标题:   Origin of hole and electron traps in graphene oxide
  • 文献类型:   Article
  • 作  者:   KOTIN IA, ANTONOVA IV, ORLOV OM, SMAGULOVA SA
  • 作者关键词:   graphene, graphene oxide, flash memory, trap
  • 出版物名称:   MATERIALS RESEARCH EXPRESS
  • ISSN:   2053-1591
  • 通讯作者地址:   Rzhanov Inst Semicond Phys SB RAS
  • 被引频次:   3
  • DOI:   10.1088/2053-1591/3/6/066301
  • 出版年:   2016

▎ 摘  要

Charge-carrier capture/emission processes proceeding with the participation of localized states in graphene oxide (GO) in test structures of Au/SiO2/GO/SiO2/Si were examined by charge deep-level transient spectroscopy (Q-DLTS). Two groups of traps capable of capturing both electrons and holes in GO were detected. The energy levels of these groups with reference to the electronic band structure of Si were found to be at E-V + 0.75 eV (E-C - 0.37 eV) and E-V + 0.55 eV (E-C - 0.55 eV). Such levels are proposed to be inherent to graphene islands in which charge carriers are emitted from energy levels in the vicinity of the Dirac point. Two groups of levels are suggested to be attributed to graphene islands, with and without p-doping with oxygen.