• 文献标题:   Conduction Tuning of Graphene Based on Defect-Induced Localization
  • 文献类型:   Article
  • 作  者:   NAKAHARAI S, IIJIMA T, OGAWA S, SUZUKI S, LI SL, TSUKAGOSHI K, SATO S, YOKOYAMA N
  • 作者关键词:   graphene, carrier transport, ion irradiation, defect, helium ion microscope, transport gap, strong localization
  • 出版物名称:   ACS NANO
  • ISSN:   1936-0851 EI 1936-086X
  • 通讯作者地址:   Natl Inst Adv Ind Sdence Technol AIST
  • 被引频次:   56
  • DOI:   10.1021/nn401992q
  • 出版年:   2013

▎ 摘  要

The conduction properties of graphene were tuned by tailoring the lattice by using an accelerated helium ion beam to embed low-density defects in the lattice. The density of the embedded defects was estimated to be 2-3 orders of magnitude lower than that of carbon atoms, and they functionalized a graphene sheet in a more stable manner than chemical surface modifications can do. Current modulation through back gate biasing was demonstrated at room temperature with a current on off ratio of 2 orders of magnitude, and the activation energy of the thermally activated transport regime was evaluated. The exponential dependence of the current on the length of the functionalized region in graphene suggested that conduction tuning is possible through strong localization of carriers at sites induced by a sparsely distributed random potential modulation.