• 文献标题:   Wafer-scale graphene-ferroelectric HfO2/Ge-HfO2/HfO(2)transistors acting as three-terminal memristors
  • 文献类型:   Article
  • 作  者:   DRAGOMAN M, DINESCU A, DRAGOMAN D, PALADE C, MOLDOVAN A, DINESCU M, TEODORESCU VS, CIUREA ML
  • 作者关键词:   memtransistor, hfo 2 ferroelectricity, graphene
  • 出版物名称:   NANOTECHNOLOGY
  • ISSN:   0957-4484 EI 1361-6528
  • 通讯作者地址:   Natl Inst Res Dev Microtechnol IMT
  • 被引频次:   0
  • DOI:   10.1088/1361-6528/abb2bf
  • 出版年:   2020

▎ 摘  要

In this paper we report a set of experiments at the wafer level regarding field-effect transistors with a graphene monolayer channel transferred on the ferroelectric HfO2/Ge-HfO2/HfO(2)three-layer structure. This kind of transistor has a switching ratio of 10(3)between on and off states due to the bandgap in graphene induced by the ferroelectric structure. Both top and back gates effectively control the carriers' charge flow in graphene. The transistor acts as a three-terminal memristor, termed a memtransistor, with applications in neuromorphic computation.