• 文献标题:   Direct growth of hBN/Graphene heterostructure via surface deposition and segregation for independent thickness regulation
  • 文献类型:   Article
  • 作  者:   LIU WY, LI XT, WANG YS, XU R, YING H, WANG L, CHENG ZH, HAO YF, CHEN SS
  • 作者关键词:   hbn, graphene, heterostructure, segregation, surface deposition, chemical vapor deposition
  • 出版物名称:   NANOTECHNOLOGY
  • ISSN:   0957-4484 EI 1361-6528
  • 通讯作者地址:  
  • 被引频次:   0
  • DOI:   10.1088/1361-6528/ac8994
  • 出版年:   2022

▎ 摘  要

Hexagonal boron nitride/graphene (hBN/G) vertical heterostructures have attracted extensive attention, owing to the unusual physical properties for basic research and electronic device applications. Here we report a facile deposition-segregation technique to synthesize hBN/G heterostructures on recyclable platinum (Pt) foil via low pressure chemical vapor deposition. The growth mechanism of the vertical hBN/G is demonstrated to be the surface deposition of hBN on top of the graphene segregated from the Pt foil with pre-dissolved carbon. The thickness of hBN and graphene can be controlled separately from sub-monolayer to multilayer through the fine control of the growth parameters. Further investigations by Raman, scanning Kelvin probe microscopy and transmission electron microscope show that the hBN/G inclines to form a heterostructure with strong interlayer coupling and with interlayer twist angle smaller than 1.5 degrees. This deposition-segregation approach paves a new pathway for large-scale production of hBN/G heterostructures and could be applied to synthesize of other van der Waals heterostructures.