• 文献标题:   Infrared photoresistance as a sensitive probe of electronic transport in twisted bilayer graphene
  • 文献类型:   Article
  • 作  者:   HUBMANN S, DI BATTISTA G, DMITRIEV IA, WATANABE K, TANIGUCHI T, EFETOV DK, GANICHEV SD
  • 作者关键词:   photoresistance, twisted bilayer graphene, infrared, temperature, bolometric, heating
  • 出版物名称:   2D MATERIALS
  • ISSN:   2053-1583
  • 通讯作者地址:  
  • 被引频次:   1
  • DOI:   10.1088/2053-1583/ac9b70
  • 出版年:   2023

▎ 摘  要

We report on observation of the infrared photoresistance of twisted bilayer graphene (tBLG) under continuous quantum cascade laser illumination at a frequency of 57.1 THz. The photoresistance shows an intricate sign-alternating behavior under variations of temperature and back gate voltage, and exhibits giant resonance-like enhancements at certain gate voltages. The structure of the photoresponse correlates with weaker features in the dark dc resistance reflecting the complex band structure of tBLG. It is shown that the observed photoresistance is well captured by a bolometric model describing the electron and hole gas heating, which implies an ultrafast thermalization of the photoexcited electron-hole pairs in the whole range of studied temperatures and back gate voltages. We establish that photoresistance can serve a highly sensitive probe of the temperature variations of electronic transport in tBLG.