• 文献标题:   Si growth at graphene surfaces on 6H-SiC(0001) substrates
  • 文献类型:   Article
  • 作  者:   SONE J, YAMAGAMI T, NAKATSUJI K, HIRAYAMA H
  • 作者关键词:  
  • 出版物名称:   JAPANESE JOURNAL OF APPLIED PHYSICS
  • ISSN:   0021-4922 EI 1347-4065
  • 通讯作者地址:   Tokyo Inst Technol
  • 被引频次:   3
  • DOI:   10.7567/JJAP.55.035502
  • 出版年:   2016

▎ 摘  要

We studied the growth of Si at the surface of epitaxial graphene on 6H-SiC(0001). Characteristic flower-like islands with a thickness of 2 to 3 nm nucleated during the growth from 290 to 420 K. The islands became featureless in growth at higher temperatures. The growth was predominantly governed by diffusion-limited aggregation. The diffusion energy was evaluated to be 0.21 eV from the temperature-dependent decrease in the density of the islands. (C) 2016 The Japan Society of Applied Physics