• 文献标题:   Electrochemical deposition of Cl-doped n-type Cu2O on reduced graphene oxide electrodes
  • 文献类型:   Article
  • 作  者:   WU SX, YIN ZY, HE QY, LU G, ZHOU XZ, ZHANG H
  • 作者关键词:  
  • 出版物名称:   JOURNAL OF MATERIALS CHEMISTRY
  • ISSN:   0959-9428 EI 1364-5501
  • 通讯作者地址:   Nanyang Technol Univ
  • 被引频次:   63
  • DOI:   10.1039/c0jm02267e
  • 出版年:   2011

▎ 摘  要

Reduced graphene oxide (rGO) electrodes can be applied for the electrochemical deposition of various semiconductor oxides. In this study, we demonstrate the electrochemical deposition of Cl-doped n-type Cu2O (Cl-Cu2O) on rGO electrodes. The structure and properties of the deposited Cl-Cu2O have been investigated extensively. Moreover, the effect of Cl doping on the carrier concentration and photocurrent of Cl-Cu2O has also been investigated. Our study shows significant implications in tailoring the properties of materials deposited on rGO electrodes by using electrochemical methods.