• 文献标题:   Tuning a Schottky barrier of epitaxial graphene/4H-SiC (0001) by hydrogen intercalation
  • 文献类型:   Article
  • 作  者:   DHARMARAJ P, JESURAJ PJ, JEGANATHAN K
  • 作者关键词:  
  • 出版物名称:   APPLIED PHYSICS LETTERS
  • ISSN:   0003-6951 EI 1077-3118
  • 通讯作者地址:   Bharathidasan Univ
  • 被引频次:   11
  • DOI:   10.1063/1.4941229
  • 出版年:   2016

▎ 摘  要

We report the electron transport properties of epitaxial graphene (EG) grown on 4H-SiC (0001) by low energy electron-beam irradiation. As-grown EG (AEG) on SiC interface exhibits rectifying current-voltage characteristics with a low Schottky barrier (SB) of 0.55 +/- 0.05 eV and high reverse current leakage. The SB of AEG/SiC junction is extremely impeded by the Fermi level pinning (FLP) above the Dirac point due to charged states at the interface. Nevertheless, a gentle hydrogen intercalation at 900 degrees C enables the alleviation of both FLP and carrier scattering owing to the saturation of dangling bonds as evidenced by the enhancement of SB (0.75 +/- 0.05 eV) and high electron mobility well excess of 6000 cm(2) V-1 s(-1). (C) 2016 AIP Publishing LLC.