• 文献标题:   Engineering Dirac states in graphene: Coexisting type-I and type-II Floquet-Dirac fermions
  • 文献类型:   Article
  • 作  者:   LIU H, SUN JT, MENG S
  • 作者关键词:  
  • 出版物名称:   PHYSICAL REVIEW B
  • ISSN:   2469-9950 EI 2469-9969
  • 通讯作者地址:   Chinese Acad Sci
  • 被引频次:   4
  • DOI:   10.1103/PhysRevB.99.075121
  • 出版年:   2019

▎ 摘  要

The coupling of monochromatic light fields and solids introduces nonequilibrium Floquet states, offering opportunities to create and explore new topological phenomena. Using combined first-principles and Floquet analysis we show that one can freely engineer Floquet-Dirac fermions (FDFs) in graphene by tuning the frequency and intensity of linearly polarized light. Not only type-II FDFs are created, but they also coexist with type-I FDFs near the Fermi level. Intriguingly, topologically nontrivial edge states connecting type-I and type-II Floquet-Dirac points emerge in photodriven graphene, providing an ideal channel to realize electron transport between the two types of Dirac states. Simulating time- and angle-resolved photoelectron spectroscopy suggests that the coexisting state of type-I and type-II fermions is experimentally accessible. This work implies that a rich FDF phenomenon can be engineered in atomically thin graphene, hinting for developments of optoelectronic and quantum computing devices.