• 文献标题:   Performance enhancement in chemical vapor deposition graphene field-effect transistors by high-kappa dielectric screening
  • 文献类型:   Article
  • 作  者:   WANG ZG, CHEN YF, LI PJ, LIU JB, TIAN HJ, QI F, ZHENG BJ, ZHOU JH
  • 作者关键词:   graphene, highkappa dielectric, screening, raman spectroscopy, chemical vapor deposition
  • 出版物名称:   MATERIALS EXPRESS
  • ISSN:   2158-5849 EI 2158-5857
  • 通讯作者地址:   Univ Elect Sci Technol China
  • 被引频次:   13
  • DOI:   10.1166/mex.2014.1146
  • 出版年:   2014

▎ 摘  要

The transport properties of CVD graphene-based field-effect transistors (GFETs) before and after introducing high-k dimethyl sulfoxide (DMSO) were investigated. The results show that after introducing DMSO, the performance of GFETs was significantly improved: the maximum drain current I-Dmax, the maximum transconductance g(mmax), and the field-effect mobility increase by 2.5, 24, and 23 times, respectively. The mechanism for the performance enhancement by high-k dielectric was analyzed by Raman spectroscopy and transport measurements, and both are consistent with each other.