• 文献标题:   Reduced Multilayer Graphene Oxide Floating Gate Flash Memory With Large Memory Window and Robust Retention Characteristics
  • 文献类型:   Article
  • 作  者:   MISHRA A, JANARDANAN A, KHARE M, KALITA H, KOTTANTHARAYIL A
  • 作者关键词:   activation energy, flash memory, multilayer graphene, program erase transient, retention
  • 出版物名称:   IEEE ELECTRON DEVICE LETTERS
  • ISSN:   0741-3106 EI 1558-0563
  • 通讯作者地址:   Indian Inst Technol
  • 被引频次:   16
  • DOI:   10.1109/LED.2013.2272643
  • 出版年:   2013

▎ 摘  要

Reduced multilayer graphene (rMLG) is investigated as a charge storage layer (CSL) in conventional floating gate (FG) flash memory structure. A large memory window of 9.4 V at +/- 20-V program/erase and robust 10-years data retention at 150 degrees C is demonstrated. Significant over-erase observed in these memory devices signifies hole storage in the rMLG sheets. Fast programming and clear saturation of the program transients observed with the rMLG CSL memory devices suggest reduced ballistic transport in the plane perpendicular to the graphene. Activation energies for programmed and erased state retention losses are calculated as 1.05 and 1.11 eV, respectively. These observations establish the potential of rMLG sheets as a replacement of conventionally used polycrystalline silicon FG.