• 文献标题:   Stacking Graphene Channels in Parallel for Enhanced Performance With the Same Footprint
  • 文献类型:   Article
  • 作  者:   FRANKLIN AD, OIDA S, FARMER DB, SMITH JT, HAN SJ, BRESLIN CM, GIGNAC L
  • 作者关键词:   double gate, fieldeffect transistor fet, graphene, parallel channel, stacked
  • 出版物名称:   IEEE ELECTRON DEVICE LETTERS
  • ISSN:   0741-3106 EI 1558-0563
  • 通讯作者地址:   IBM Corp
  • 被引频次:   0
  • DOI:   10.1109/LED.2013.2242428
  • 出版年:   2013

▎ 摘  要

Using the unique ability of graphene to be transferred to virtually any surface, field-effect transistors are demonstrated with vertically stacked graphene channels that are electrically connected in parallel. The graphene in each layer is double gated, with all gates in the stack connected to a common gate electrode. We show that the performance of these devices scales linearly with the number of stacked graphene channels at rates of approximately 500 mu A/mu m and 200 mu S/mu m per layer for the ON-current and peak transconductance, respectively. This demonstration reveals the ability to employ graphene in a novel fashion for tuning and amplifying the performance of a transistor without changing the device footprint.