• 文献标题:   Topology evolution of graphene in chemical vapor deposition, a combined theoretical/experimental approach toward shape control of graphene domains
  • 文献类型:   Article
  • 作  者:   FAN LL, ZOU J, LI Z, LI X, WANG KL, WEI JQ, ZHONG ML, WU DH, XU ZP, ZHU HW
  • 作者关键词:  
  • 出版物名称:   NANOTECHNOLOGY
  • ISSN:   0957-4484 EI 1361-6528
  • 通讯作者地址:   Tsinghua Univ
  • 被引频次:   35
  • DOI:   10.1088/0957-4484/23/11/115605
  • 出版年:   2012

▎ 摘  要

Morphology control of thin film relies on understanding multiple ongoing processes during deposition and growth. To reveal the shape evolution of graphene domains on copper surfaces in chemical vapor deposition (CVD), a combinative study is performed on the CVD growth of graphene on copper surfaces. To identify the factors that influence the adsorption and diffusion of carbon atoms and further determine the domain shape, simulations based on kinetic Monte Carlo techniques are carried out. The results reveal the dependence of the graphene domain shapes on the crystalline orientation of the underlying copper substrate surfaces.