• 文献标题:   Effective work function lowering of multilayer graphene films by subnanometer thick AlOx overlayers
  • 文献类型:   Article
  • 作  者:   YI Y, CHOI WM, KIM YH, KIM JW, KANG SJ
  • 作者关键词:  
  • 出版物名称:   APPLIED PHYSICS LETTERS
  • ISSN:   0003-6951
  • 通讯作者地址:   Kyung Hee Univ
  • 被引频次:   29
  • DOI:   10.1063/1.3534795
  • 出版年:   2011

▎ 摘  要

A simple method for controlling the effective work function (WF) of conductive multilayer graphene (MLG) film, synthesized by using chemical vapor deposition and transferred to a dielectric substrate, was developed. The WFs of the MLG during the step-by-step deposition of aluminum (Al) were measured using in situ ultraviolet photoelectron spectroscopy. Core-level spectra were also collected to investigate the chemical reaction that occurred when a small amount of Al was deposited onto MLG in a stepwise manner. The measurements revealed that the effective WF of the conductive MLG film could be controlled from 3.77 to 4.40 eV by the deposition of an Al layer less than 0.6 nm thick. (c) 2011 American Institute of Physics. [doi:10.1063/1.3534795]