• 文献标题:   The density of states of graphene underneath a metal electrode and its correlation with the contact resistivity
  • 文献类型:   Article
  • 作  者:   IFUKU R, NAGASHIO K, NISHIMURA T, TORIUMI A
  • 作者关键词:  
  • 出版物名称:   APPLIED PHYSICS LETTERS
  • ISSN:   0003-6951 EI 1077-3118
  • 通讯作者地址:   Univ Tokyo
  • 被引频次:   27
  • DOI:   10.1063/1.4815990
  • 出版年:   2013

▎ 摘  要

The density of states (DOS) of graphene underneath a metal is estimated through a quantum capacitance measurement of the metal/graphene/SiO2/n(+)-Si contact structure fabricated by a resist-free metal deposition process. Graphene underneath Au maintains a linear DOS-energy relationship except near the Dirac point, whereas the DOS of graphene underneath Ni is broken and largely enhanced around the Dirac point, resulting in only a slight modulation of the Fermi energy. Moreover, the DOS of graphene in the contact structure is correlated with the contact resistivity measured using devices fabricated by the resist-free process. (C) 2013 AIP Publishing LLC.