• 文献标题:   Advanced interface modelling of n-Si/HNO3 doped graphene solar cells to identify pathways to high efficiency
  • 文献类型:   Article
  • 作  者:   ZHAO J, MA FJ, DING K, ZHANG H, JIE JS, HOBAILLIE A, BREMNER SP
  • 作者关键词:   doped graphene, solar cell, heterojunction
  • 出版物名称:   APPLIED SURFACE SCIENCE
  • ISSN:   0169-4332 EI 1873-5584
  • 通讯作者地址:   Univ New South Wales
  • 被引频次:   3
  • DOI:   10.1016/j.apsusc.2017.10.163
  • 出版年:   2018

▎ 摘  要

In graphene/silicon solar cells, it is crucial to understand the transport mechanism of the graphene/silicon interface to further improve power conversion efficiency. Until now, the transport mechanism has been predominantly simplified as an ideal Schottky junction. However, such an ideal Schottky contact is never realised experimentally. According to literature, doped graphene shows the properties of a semiconductor, therefore, it is physically more accurate to model graphene/silicon junction as a Heterojunction. In this work, HNO3-doped graphene/silicon solar cells were fabricated with the power conversion efficiency of 9.45%. Extensive characterization and first-principles calculations were carried out to establish an advanced technology computer-aided design (TCAD) model, where p-doped graphene forms a straddling heterojunction with the n-type silicon. In comparison with the simple Schottky junction models, our TCAD model paves the way for thorough investigation on the sensitivity of solar cell performance to graphene properties like electron affinity. According to the TCAD heterojunction model, the cell performance can be improved up to 22.5% after optimizations of the antireflection coatings and the rear structure, highlighting the great potentials for fabricating high efficiency graphene/silicon solar cells and other optoelectronic devices. (C) 2017 Elsevier B.V. All rights reserved.