• 文献标题:   Stability and extreme ultraviolet photo-reduction of graphene during C-K edge NEXAFS characterization
  • 文献类型:   Article
  • 作  者:   GERLIN F, ZUPPELLA P, CORSO AJ, NARDELLO M, TESSAROLO E, BACCO D, PELIZZO MG
  • 作者关键词:  
  • 出版物名称:   SURFACE COATINGS TECHNOLOGY
  • ISSN:   0257-8972
  • 通讯作者地址:   Natl Res Council Italy
  • 被引频次:   2
  • DOI:   10.1016/j.surfcoat.2016.04.030
  • 出版年:   2016

▎ 摘  要

Here, we show research innovation in radiation-matter interaction, with possible photonics and optoelectronics applications in building and maintenance of graphene-based devices, as well as a further confirmation for soft x-ray irradiation as a clean route towards graphene photoreduction. Thus, we have investigated the soft x-rays exposure effects on graphene/nickel samples damaged by nanosecond 1064 nm Nd:YAG laser under laser fluence above the damage threshold. In this regard, NEXAFS analyses reveal the typical GO features in the C K edge spectra of the irradiated specimens. Moreover, the continuous exposures to soft x-rays radiation show the photo reduction process monitored by NEXAFS in real time. Ten-hour soft x-ray exposure moves the spectra towards the typical one of the graphene. (C) 2016 Elsevier B.V. All rights reserved.