• 文献标题:   Surface Potential of Graphene Oxide Investigated by Kelvin Probe Force Microscopy
  • 文献类型:   Article
  • 作  者:   LI J, QI X, HAO GL, HUANG K, ZHONG JX
  • 作者关键词:   graphene, graphene oxide, suraface potential
  • 出版物名称:   FULLERENES NANOTUBES CARBON NANOSTRUCTURES
  • ISSN:   1536-383X EI 1536-4046
  • 通讯作者地址:   Xiangtan Univ
  • 被引频次:   4
  • DOI:   10.1080/1536383X.2014.997353
  • 出版年:   2015

▎ 摘  要

In the paper, the graphene oxide (GO) prepared by modified Hummers method was characterized by Raman spectrum, Fourier transform infrared spectrum (FTIR), and Atomic Force Microscopy (AFM). Using Kelvin Probe Force Microscopy (KPFM), the surface potential of GO was investigated, and it was found that the GO film exhibited the uniform surface potential distribution. The surface potentials at the edges and wrinkles of GO film were much lower than that at the in-plane flat area, which is proposed to be contributed to the bonds' unsaturated and disorder at these zones. These results provide insight into understanding electronic properties of GO-based composites and devices.