• 文献标题:   Atomic deuteration of epitaxial many-layer graphene on 4H-SiC(0001)
  • 文献类型:   Article
  • 作  者:   MAZZA AR, MIETTINEN A, CONRAD M, CHARLTON TR, HE XQ, GUHA S, BIAN G, LIN J, CONRAD EH, MICELI PF
  • 作者关键词:  
  • 出版物名称:   JOURNAL OF VACUUM SCIENCE TECHNOLOGY B
  • ISSN:   2166-2746
  • 通讯作者地址:   Univ Missouri
  • 被引频次:   0
  • DOI:   10.1116/1.5095961
  • 出版年:   2019

▎ 摘  要

From studies of single-layer graphene, the authors find that atomic deuteration indeed does lead to reversible chemisorption. However, they find that atomic deuterium treatment of many-layer epitaxially grown graphene on C-face 4H-SiC only affects the surface graphene layer and the buried graphene/SiC interface. Raman and x-ray diffraction experiments reveal that only a small portion of the graphene is affected, showing no interlayer incorporation of deuterium. However, x-ray reflectivity and cross-sectional transmission electron microscopy demonstrate a change of the buried graphene/SiC interface, which resembles a delamination of graphene from the substrate. In some cases, multiple atomic treatments lead to complete delamination of the graphene film. Published by the AVS.