• 文献标题:   Observation of negative contact resistances in graphene field-effect transistors
  • 文献类型:   Article
  • 作  者:   NOUCHI R, SAITO T, TANIGAKI K
  • 作者关键词:  
  • 出版物名称:   JOURNAL OF APPLIED PHYSICS
  • ISSN:   0021-8979
  • 通讯作者地址:   Osaka Prefecture Univ
  • 被引频次:   19
  • DOI:   10.1063/1.4705367
  • 出版年:   2012

▎ 摘  要

The gate-voltage (V-G) dependence of the contact resistance (R-C) in graphene field-effect transistors is characterized by the transmission line model. The R-C-V-G characteristics of Ag, Cu, and Au contacts display a dip around the charge neutrality point and become even negative with Ag contacts. The dip structure is well reproduced by a model calculation that considers a metal-contact-induced potential variation near the metal contact edges. The apparently negative R-C originates with the carrier doping from the metal contacts to the graphene channel and appears when the doping effect is more substantial than the actual contact resistance precisely at the contacts. The negative R-C can appear at the metal contacts to Dirac-cone systems such as graphene. (C) 2012 American Institute of Physics. [http://dx.doi.org/10.1063/1.4705367]