• 文献标题:   Temperature dependence of the thickness and morphology of epitaxial graphene grown on SiC (0001) wafers
  • 文献类型:   Article
  • 作  者:   HAO X, CHEN YF, LI PJ, WANG ZG, LIU JB, HE JR, FAN R, SUN JR, ZHANG WL, LI YR
  • 作者关键词:   epitaxial graphene, thicknes, morphology, graphitization temperature
  • 出版物名称:   CHINESE PHYSICS B
  • ISSN:   1674-1056 EI 1741-4199
  • 通讯作者地址:   Univ Elect Sci Technol China
  • 被引频次:   14
  • DOI:   10.1088/1674-1056/21/4/046801
  • 出版年:   2012

▎ 摘  要

Epitaxial graphene is synthesized by silicon sublimation from the Si-terminated 6H-SiC substrate. The effects of graphitization temperature on the thickness and surface morphology of epitaxial graphene are investigated. X-ray photoelectron spectroscopy spectra and atomic force microscopy images reveal that the epitaxial graphene thickness increases and the epitaxial graphene roughness decreases with the increase in graphitization temperature. This means that the thickness and roughness of epitaxial graphene films can be modulated by varying the graphitization temperature. In addition, the electrical properties of epitaxial graphene film are also investigated by Hall effect measurement.