• 文献标题:   Van der Waals heterostructure of graphene and As2S3: Tuning the Schottky barrier height by vertical strain
  • 文献类型:   Article
  • 作  者:   LIU XF, LV B, DING Z, LUO ZJ
  • 作者关键词:   graphene/as2s3 interface, vertical strain, schottky barrier height, first principle
  • 出版物名称:   JOURNAL OF CRYSTAL GROWTH
  • ISSN:   0022-0248 EI 1873-5002
  • 通讯作者地址:   Guizhou Univ Finance Econ
  • 被引频次:   0
  • DOI:   10.1016/j.jcrysgro.2020.125882
  • 出版年:   2020

▎ 摘  要

Graphene-based van der Waals (vdW) heterojunction has attracted increasing attention in the field of optoelectronics, nanoelectronics, and spintronics. The tunability of Schottky barrier height (SBH) formed in such kind of heterojunction is rather of significance for practical applications. In this study, based on first-principles calculations, we have systematically investigated the electronic structures and interfacial characteristics of graphene/As2S3 heterojunction. The results show the intrinsic electronic properties of the corresponding individual counterparts are preserved after contacting. The Bader charge analysis indicates the transferred amounts of electrons from As2S3 to graphene increasing with the decrease of interlayer distance. Consequently, the Schottky contact will be tuned from n-type into p-type once the interlayer distance is lower than 2.78 angstrom. Our findings imply that the SBH is controllable, which is highly desirable in the nano-electronic devices.