• 文献标题:   Graphene doped TiO2/p-silicon heterojunction photodiode
  • 文献类型:   Article
  • 作  者:   HENDI AA, YAKUPHANOGLU F
  • 作者关键词:   graphene oxide, titanium dioxide, photodiode
  • 出版物名称:   JOURNAL OF ALLOYS COMPOUNDS
  • ISSN:   0925-8388 EI 1873-4669
  • 通讯作者地址:   Firat Univ
  • 被引频次:   18
  • DOI:   10.1016/j.jallcom.2016.01.045
  • 出版年:   2016

▎ 摘  要

The photoresponse properties of Al/p-Si/GO:TiO2/Au diodes were investigated using transient photocurrent and conductance spectroscopy techniques. The average barrier height and ideality factor values of the diodes were found to be 0.601 +/- 0.001 eV and 17.9.3 +/- 9. It is seen that the electronic parameters of the diodes depend on GO content. The obtained ideality factor is higher than unity due to the low carrier mobility of the organic interlayer. The change in the capacitance of the diodes indicates a continuous distribution of interface states. The photoresponse properties of the diodes are changed with GO content. Al/p-Si/GO:TiO2/Au having 3% GO weight exhibited the highest photosensitivity. The obtained results indicates that the prepared photodiodes can be used as a photosensor in optoelectronic device applications. (C) 2016 Elsevier B.V. All rights reserved.