• 文献标题:   Gate controlled resistive switching behavior of heterostructure in the Ni-Co layered double hydroxide/graphene oxide transistor
  • 文献类型:   Article
  • 作  者:   YUAN Q, HE N, WANG YF, SUN YM, WEN DZ
  • 作者关键词:   transistor, graphene oxide, ni co layered double hydroxide, resistive switching
  • 出版物名称:   APPLIED SURFACE SCIENCE
  • ISSN:   0169-4332 EI 1873-5584
  • 通讯作者地址:  
  • 被引频次:   0
  • DOI:   10.1016/j.apsusc.2022.153608 EA MAY 2022
  • 出版年:   2022

▎ 摘  要

A novel heterostructure consisting of two dimensional nanocomposite Ni-Co layered double hydroxides (Ni-Co LDHs) and graphene with adjustable Fermi levels has been studied. Transistor characteristics and memristor properties of the Ni-Co LDHs/graphene oxide heterostructure have been investigated. In consideration of Fermi energy of graphene is modulated under external applied voltage, by constructing Schottky barrier, the current and threshold voltage of the device were effectively modulated by applied different gate voltage. The Ni-Co LDHs/graphene oxide heterostructure device exhibits a good endurance property, as well as data retention property is up to 104 s. The resistive switching characteristics are achieved via the conductive filament. The performance and scheme design of this device have a good prospect in memory applications.