• 文献标题:   Synthesis and characterization of graphene layers prepared by low-pressure chemical vapor deposition using triphenylphosphine as precursor
  • 文献类型:   Article
  • 作  者:   MASTRAPA GC, DA COSTA MEHM, LARRUDE DG, FREIRE FL
  • 作者关键词:   monolayer, chemical vapour deposition, xray photoemission spectroscopy, raman spectroscopy scattering, electron microscopy
  • 出版物名称:   MATERIALS CHEMISTRY PHYSICS
  • ISSN:   0254-0584 EI 1879-3312
  • 通讯作者地址:   Pontificia Univ Catolica Rio de Janeiro
  • 被引频次:   5
  • DOI:   10.1016/j.matchemphys.2015.04.005
  • 出版年:   2015

▎ 摘  要

The synthesis of a single-layer graphene using a low-pressure Chemical Vapor Deposition (CVD) system with triphenylphosphine as precursor is reported. The amount of triphenylphosphine used as precursor was in the range of 10-40 mg. Raman spectroscopy was employed to analyze samples prepared with 10 mg of the precursor, and these spectra were found typical of graphene. The Raman measurements indicate that the progressive degradation of graphene occurs as the amount of triphenylphosphine increases. X-ray photoelectron spectroscopy measurements were performed to investigate the different chemical environments involving carbon and phosphorous atoms. Scanning electron microscopy and transmission electron microscopy were also employed and the results reveal the formation of dispersed nanostructures on top of the graphene layer, In addition, the number of these nanostructures is directly related to the amount of precursor used for sample growth. (C) 2015 Elsevier B.V. All rights reserved.