• 文献标题:   Engineering Schottky barrier in vertical graphene/InN heterostructure
  • 文献类型:   Article
  • 作  者:   LIU YH, LI H, LIU FB, SUN S, ZHOU G, QING T, ZHANG SH, LU J
  • 作者关键词:   graphene, inn vdwh, contact character, interface coupling, electric field
  • 出版物名称:   SOLID STATE COMMUNICATIONS
  • ISSN:   0038-1098 EI 1879-2766
  • 通讯作者地址:  
  • 被引频次:   0
  • DOI:   10.1016/j.ssc.2022.114770 EA APR 2022
  • 出版年:   2022

▎ 摘  要

In recent years, van der Waals stacked heterostructures (vdWHs) have gained much study interest for enhancing nanoelectronics' performance. We take the first-principles methods to study the interface contact characters of the graphene/InN vdWH under the interlayer coupling and electric field. The natural electronic characters of both the graphene and InN components keep intact at the equilibrium interlayer distance with an n-type Schottky contact. Impressively, it tunes to Ohmic contact when the interlayer distance increases to 4.73 angstrom or the applying negative electric field increases to-0.42 V/angstrom, while it converts to p-type Schottky contact under a positive electric field greater than 0.2 V/angstrom. These findings are of great significance for the application of graphene/InN vdWH in high-performance nanoelectronics.