• 文献标题:   Direct characterization of graphene doping state by in situ photoemission spectroscopy with Ar gas cluster ion beam sputtering
  • 文献类型:   Article
  • 作  者:   YUN DJ, KIM S, JUNG C, LEE CS, SOHN H, WON JY, KIM YS, CHUNG J, HEO S, KIM SH, SEOL M, SHIN WH
  • 作者关键词:  
  • 出版物名称:   PHYSICAL CHEMISTRY CHEMICAL PHYSICS
  • ISSN:   1463-9076 EI 1463-9084
  • 通讯作者地址:   Samsung Adv Inst Technol
  • 被引频次:   4
  • DOI:   10.1039/c7cp06450k
  • 出版年:   2018

▎ 摘  要

On the basis of an in situ photoemission spectroscopy (PES) system, we propose a novel, direct diagnosis method for the characterization of graphene (Gr) doping states at organic semiconductor (OSC)/electrode interfaces. Our in situ PES system enables ultraviolet/X-ray photoelectron spectroscopy (UPS/XPS) measurements during the OSC growth or removal process. We directly deposit C-60 films on three different p-type dopants-gold chloride (AuCl3), (trifluoromethyl-sulfonyl) imide (TFSI), and nitric acid (HNO3). We periodically characterize the chemical/electronic state changes of the C-60/Gr structures during their aging processes under ambient conditions. Depositing the OSC on the p-type doped Gr also prevents severe degradation of the electrical properties, with almost negligible transition over one month, while the p-type doped Gr without an OSC changes a lot following one month of aging. Our results indicate that the chemical/electronic structures of the Gr layer are completely reflected in the energy level alignments at the C-60/Gr interfaces. Therefore, we strongly believe that the variation of energy level alignments at the OSC/graphene interface is a key standard for determining the doping state of graphene after a certain period of aging.