• 文献标题:   High-yield fabrication of nm-size gaps in monolayer CVD graphene
  • 文献类型:   Article
  • 作  者:   NEF C, POSA L, MAKK P, FU WY, HALBRITTER A, SCHONENBERGER C, CALAME M
  • 作者关键词:  
  • 出版物名称:   NANOSCALE
  • ISSN:   2040-3364 EI 2040-3372
  • 通讯作者地址:   Univ Basel
  • 被引频次:   44
  • DOI:   10.1039/c4nr01838a
  • 出版年:   2014

▎ 摘  要

Herein we demonstrate the controlled and reproducible fabrication of sub-5 nm wide gaps in single-layer graphene electrodes. The process is implemented for graphene grown via chemical vapor deposition using an electroburning process at room temperature and in vacuum. A yield of over 95% for the gap formation is obtained. This approach allows producing single-layer graphene electrodes for molecular electronics at a large scale. Additionally, from Raman spectroscopy and electroburning carried out simultaneously, we can follow the heating process and infer the temperature at which the gap formation happens.