• 文献标题:   Ultrahigh Conductive Copper/Large Flake Size Graphene Heterostructure Thin-Film with Remarkable Electromagnetic Interference Shielding Effectiveness
  • 文献类型:   Article
  • 作  者:   WANG Z, MAO BY, WANG QL, YU J, DAI JX, SONG RG, PU ZH, HE DP, WU Z, MU SC
  • 作者关键词:   electrical conductivity, electromagnetic interference shielding, film, large flake size graphene, thermal conductivity
  • 出版物名称:   SMALL
  • ISSN:   1613-6810 EI 1613-6829
  • 通讯作者地址:   Wuhan Univ Technol
  • 被引频次:   13
  • DOI:   10.1002/smll.201704332
  • 出版年:   2018

▎ 摘  要

To guarantee the normal operation of next generation portable electronics and wearable devices, together with avoiding electromagnetic wave pollution, it is urgent to find a material possessing flexibility, ultrahigh conductive, and superb electromagnetic interference shielding effectiveness (EMI SE) simultaneously. In this work, inspired by a building bricks toy with the interlock system, we design and fabricate a copper/large flake size graphene (Cu/LG) composite thin film (approximate to 8.8 mu m) in the light of high temperature annealing of a large flake size graphene oxide film followed by magnetron sputtering of copper. The obtained Cu/LG thin-film shows ultrahigh thermal conductivity of over 1932.73 (+/- 63.07) W m(-1) K-1 and excellent electrical conductivity of 5.88 (+/- 0.29) x 10(6) S m(-1). Significantly, it also exhibits a remarkably high EMI SE of over 52 dB at the frequency of 1-18 GHz. The largest EMI SE value of 63.29 dB, accorded at 1 GHz, is enough to obstruct and absorb 99.99995% of incident radiation. To the best of knowledge, this is the highest EMI SE performance reported so far in such thin thickness of graphene-based materials. These outstanding properties make Cu/LG film a promising alternative building block for power electronics, microprocessors, and flexible electronics.