• 文献标题:   Low resistivity of graphene nanoribbons with zigzag-dominated edge fabricated by hydrogen plasma etching combined with Zn/HCl pretreatment
  • 文献类型:   Article
  • 作  者:   LIU FK, LI Q, WANG RB, XU JB, HU JX, LI WW, GUO YF, QIAN YT, DENG W, ULLAH Z, ZENG ZM, SUN MT, LIU LW
  • 作者关键词:  
  • 出版物名称:   APPLIED PHYSICS LETTERS
  • ISSN:   0003-6951 EI 1077-3118
  • 通讯作者地址:   Chinese Acad Sci
  • 被引频次:   1
  • DOI:   10.1063/1.4996055
  • 出版年:   2017

▎ 摘  要

Graphene nanoribbons (GNRs) have attracted intensive research interest owing to their potential applications in high performance graphene-based electronics. However, the deterioration of electrical performance caused by edge disorder is still an important obstacle to the applications. Here, we report the fabrication of low resistivity GNRs with a zigzag-dominated edge through hydrogen plasma etching combined with the Zn/HCl pretreatment method. This method is based on the anisotropic etching properties of hydrogen plasma in the vicinity of defects created by sputtering zinc (Zn) onto planar graphene. The polarized Raman spectra measurement of GNRs exhibits highly polarization dependence, which reveals the appearance of the zigzag-dominated edge. The as-prepared GNRs exhibit high carrier mobility (similar to 1332.4 cm(2) v(-1) s(-1)) and low resistivity (similar to 0.7 k Omega) at room temperature. Particularly, the GNRs can carry large current density (5.02 x 10(8) A cm(-2)) at high voltage (20.0 V) in the air atmosphere. Our study develops a controllable method to fabricate zigzag edge dominated GNRs for promising applications in transistors, sensors, nanoelectronics, and interconnects. Published by AIP Publishing.