• 文献标题:   Graphene reduction dynamics unveiled
  • 文献类型:   Article
  • 作  者:   TSAI HC, SHIU HW, CHUANG MC, CHEN CH, SU CY, WHITE JD, WOON WY
  • 作者关键词:   graphene, defect, scanning probe lithography, reduction, photoelectron spectroscopy
  • 出版物名称:   2D MATERIALS
  • ISSN:   2053-1583
  • 通讯作者地址:   Natl Cent Univ
  • 被引频次:   7
  • DOI:   10.1088/2053-1583/2/3/031003
  • 出版年:   2015

▎ 摘  要

The reduction dynamics of micron-sized defects created on chemical vapor deposition-(CVD) grown graphene through scanning probe lithography (SPL) is reported here. CVD-grown graphene was locally oxidized using SPL and subsequently reduced, making use of a focused beam of soft x-rays. During this whole process, the reduction dynamics was monitored using a combination of micro-Raman spectroscopy (mu-RS) and micro-x-ray photoelectron spectroscopy (mu-XPS). After x-ray reduction, the graphene film was found to be chemically identical (mu-XPS) but structurally different (mu-RS) from the original graphene. During reduction the population of C-C bonds was found to first increase dramatically and then decrease exponentially. By modeling the dynamics of the C=O -> C-O -> C-C -> C=C reduction process with four coupled-rate equations and three rate constants, the conversion from C-Cto C=C bonds was found to be the limiting rate.