• 文献标题:   Stability analysis of multilayer vertical graphene nanoribbon interconnects
  • 文献类型:   Article
  • 作  者:   KUMARI B, SAHOO M
  • 作者关键词:   vgnr, stability, interconnect
  • 出版物名称:   MATERIALS RESEARCH EXPRESS
  • ISSN:  
  • 通讯作者地址:   IIT ISM
  • 被引频次:   1
  • DOI:   10.1088/2053-1591/ab1b92
  • 出版年:   2019

▎ 摘  要

In this work, stability of lithium intercalation doped Multilayer Vertical Graphene Nanoribbon (ML-VGNR) interconnects is estimated and compared with existing copper and lithium intercalated Multilayer Horizontal Graphene Nanoribbon (ML-HGNR) interconnects. ML-VGNR interconnects have a sharp, well behaved transient response among all the interconnect configurations. An isolated copper interconnect has the highest stability but when crosstalk is considered, ML-VGNR interconnect is the most stable one. This work for the first time analyzes and compares the stability of ML-VGNR, ML-HGNR and copper interconnects on isolated, single interconnect and 3-interconnect configurations.