• 文献标题:   Epitaxial Heterostructures of Ultrathin Topological Insulator Nanoplate and Graphene
  • 文献类型:   Article
  • 作  者:   DANG WH, PENG HL, LI H, WANG P, LIU ZF
  • 作者关键词:   topological insulator, graphene, dirac material, bismuth selenide, van der waals epitaxy
  • 出版物名称:   NANO LETTERS
  • ISSN:   1530-6984 EI 1530-6992
  • 通讯作者地址:   Peking Univ
  • 被引频次:   163
  • DOI:   10.1021/nl100938e
  • 出版年:   2010

▎ 摘  要

The authors present a van der Waals epitaxy of high-quality ultrathin nanoplates of topological insulator Bi2Se3 on a pristine graphene substrate using a simple vapor-phase deposition method. Sub-10-nm-thick nanoplates of layered Bi2Se3 with defined orientations can be epitaxially grown on a few-layer pristine graphene substrate. We show the evolution of Raman spectra with the number of Bi2Se3 layers on few-layer graphene. Bi2Se3 nanoplates with a thickness of three quintuple-layers (3-QL) exhibit the strongest Raman intensity. Strain effects in the Bi2Se3/graphene nanoplate heterostructures is also studied by Raman spectroscopy. 1-QL and 2-QL Bi2Se3 nanoplates experience tensile stress, consistent with compressive stress in single-layer and bilayer graphene substrates. Our results suggest an approach for the synthesis of epitaxial heterostructures that consist of an ultrathin topological insulator and graphene, which may be a new direction for electronic and spintronic applications.