• 文献标题:   Electrochemical Integration of Graphene with Light-Absorbing Copper-Based Thin Films
  • 文献类型:   Article
  • 作  者:   PADMANABHAN M, ROY K, RAMALINGAM G, RAGHAVAN S, GHOSH A
  • 作者关键词:  
  • 出版物名称:   JOURNAL OF PHYSICAL CHEMISTRY C
  • ISSN:   1932-7447 EI 1932-7455
  • 通讯作者地址:   Indian Inst Sci
  • 被引频次:   4
  • DOI:   10.1021/jp208120u
  • 出版年:   2012

▎ 摘  要

We present an electrochemical route for the integration of graphene with light-sensitive copper-based alloys used in optoelectronic applications. Graphene grown using chemical vapor deposition (CVD) transferred to glass is found to be a robust substrate on which photoconductive CuxS films of 1-2 mu m thickness can be deposited. The effect of growth parameters on the morphology and photoconductivity of CuxS films is presented. Current-voltage (I-V) characterization and photoconductivity decay experiments are performed with graphene as one contact and silver epoxy as the other.