• 文献标题:   Graphene Coating of Silicon Nanoparticles with CO2-Enhanced Chemical Vapor Deposition
  • 文献类型:   Article
  • 作  者:   SON IH, PARK JH, KWON S, CHOI JW, RUMMELI MH
  • 作者关键词:   co2, chemical vapour deposition, electrochemistry, graphene, si nanoparticle
  • 出版物名称:   SMALL
  • ISSN:   1613-6810 EI 1613-6829
  • 通讯作者地址:   Samsung Elect Co Ltd
  • 被引频次:   14
  • DOI:   10.1002/smll.201502880
  • 出版年:   2016

▎ 摘  要

Understanding the growth of graphene over Si species is becoming ever more important as the huge potential for the combination of these two materials becomes more apparent, not only for device fabrication but also in energy applications, particularly in Li-ion batteries. Thus, the drive for the direct fabrication of graphene over Si is crucial because indirect approaches, by their very nature, require processing steps that, in general, contaminate, damage, and are costly. In this work, the direct chemical vapor deposition growth of few-layer graphene over Si nanoparticles is systematically explored through experiment and theory with the use of a reducer, H-2 or the use of a mild oxidant, CO2 combined with CH4. Unlike the case of CH4, with the use of CO2 as a mild oxidant in the reaction, the graphene layers form neatly over the surface and encapsulate the Si particles. SiC formation is also prevented. These structures show exceptionally good electrochemical performance as high capacity anodes for lithium-ion batteries. Density functional theory studies show the presence of CO2 not only prevents SiC formation but helps enhance the catalytic activity of the particles by maintaining an SiOx surface. In addition, CO2 can enhance graphitization.